厚度和掺杂浓度对背照式倍增SAM型光电探测器性能的影响

Effect of Thickness and Doping Concentration on the Performance of Back-illuminated Multiplication SAM-type Photodetectors

  • 摘要: 红外光电探测器在军事侦察、光通信和医疗成像等领域具有广泛应用,对其在高响应度、低暗电流与快速响应之间的综合性能提出了更高要求。倍增SAM结构因其将载流子吸收与雪崩倍增过程物理分离,成为当前提升红外探测器性能的重要结构之一。本文基于Silvaco ATLAS仿真平台,构建了二维背照式倍增SAM型探测器模型,系统分析了厚度与掺杂浓度对器件光电性能的影响。结果表明,剥离GaAs衬底后,器件在0.6μm波长处首次出现光响应,且在1.5μm处,峰值响应度由未剥离前的0显著提升至0.65 A/W;偏压为-0.4 V时,暗电流从1.964× 10-9 A减小到7.827× 10-10 A;峰值响应度提高至2.44 A/W。

     

    Abstract: Infrared photodetectors have extensive applications in military reconnaissance, optical communication, and medical imaging. Higher requirements are placed on their comprehensive performance in terms of high responsivity, low dark current, and fast response. The multiplication SAM structure, which physically separates the carrier absorption and avalanche multiplication processes, has become an important structure for improving the performance of infrared detectors. Based on the Silvaco ATLAS simulation platform, a two-dimensional back-illuminated multiplication SAM detector model was constructed in this paper, and the influence of the thickness and doping concentration was systematically analyzed. The results show that after the GaAs substrate is stripped, the device first shows a photoresponse at a wavelength of 0.6 μm, and the peak responsivity increases from 0 to 0.65 A/W at 1.5 μm. The optimization of the buffer layer reduces the dark current from 1.964×10-9 A to 7.827×10-10 A at a bias of -0.4 V. The adjustment of the absorption layer parameters can increase the peak responsivity to 2.44 A/W.

     

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