Citation: | XIONG Bojun, LI Lihua, YANG Chaowei, LI Xiongjun, ZHAO Peng, WAN Zhiyuan. As Ion Implantation Technology for LWIR HgCdTe Infrared Detector[J]. Infrared Technology , 2022, 44(2): 129-133. |
[1] |
LEI W, Antoszewski J, Faraone L. Progress, challenges, and opportunities for HgCdTe infrared materials and detectors[J]. Applied Physics Reviews, 2015, 2(4): 041303. DOI: 10.1063/1.4936577
|
[2] |
Rogalski A, Martyniuk P, Kopytko M. Challenges of small-pixel infrared detectors: a review[J]. Reports on Progress in Physics, 2016, 79(4): 046501. DOI: 10.1088/0034-4885/79/4/046501
|
[3] |
Korotaev A G, Izhnin I I, Mynbaev K D, et al. Hall-effect studies of modificationof HgCdTe surface properties with ion implantation and thermal annealing[J]. Surface & Coatings Technology, 2020, 393: 125721.
|
[4] |
Bubulac L O, Lo D S, Tennant W E, et al. p on n ion implanted junctions in liquid phase epitaxy HgCdTe layers on CdTe substrates[J]. Applied Physics Letters, 1987, 50(22): 1586-1588. DOI: 10.1063/1.97788
|
[5] |
Baier N, Cervera C, Gravrand O, et al. Latest developments in long-wavelength and very-long-wavelength infrared detection with p-on-n HgCdTe[J]. Journal of Electronic Materials, 2015, 44(9): 3144-3150. DOI: 10.1007/s11664-015-3851-0
|
[6] |
Izhnin I I, Fitsych O I, Świątek Z, et al. Effect of annealing on the structural properties of arsenic-implanted mercury cadmium telluride[J]. Opto-Electron Review, 2019, 27(1): 14-17. DOI: 10.1016/j.opelre.2019.01.002
|
[7] |
Robinson H G, Berding M A, Hamilton W J. Enhanced diffusion and interdiffusion in HgCdTe from Fermi-level effects[J]. Journal of Electronic Materials, 2000, 29(6): 657-663. DOI: 10.1007/s11664-000-0201-6
|
[8] |
陈慧卿, 史春伟, 胡尚正, 等. 中波镉汞p-on-n高温工作技术研究[J]. 激光与红外, 2020, 50(4): 435-438. DOI: 10.3969/j.issn.1001-5078.2020.04.009
CHEN H Q, SHI C W, HU S Z, et al. Study on p-on-n technology of the MWIR HgCdTe for hot work[J]. Laser and Infrared, 2020, 50(4): 435-438. DOI: 10.3969/j.issn.1001-5078.2020.04.009
|
[9] |
Arias J M, Pasko J G, Zandian M, et al. MBE HgCdTe heterostructure p-on-n planar infrared photodiodes[J]. Journal of Electronic Materials, 1993, 22(8): 1049-1053. DOI: 10.1007/BF02817523
|
[10] |
Mollard L, Destefanis G, Baier N, et al. Planar p-on-n HgCdTe FPAs by arsenic ion implantation[J]. Journal of Electronic Materials, 2009, 38(8): 1805-1813. DOI: 10.1007/s11664-009-0829-9
|
[11] |
Schaake H F. Kinetics of activation of group V impurities in Hg1−xCdxTe alloys[J]. Journal of Applied Physics, 2000, 88(4): 1765-1770. DOI: 10.1063/1.1302738
|
[12] |
Berding M A, Sher A, van Schilfgaarde M, et al. Modeling of arsenic activation in HgCdTe[J]. Journal of Electronic Materials, 1998, 27(6): 605-609. DOI: 10.1007/s11664-998-0023-5
|
[13] |
Shaw D. An activation model for the As acceptor in HgCdTe[J]. Semiconductor Science Technology, 2008, 23(78): 085014.
|
[14] |
Baier N, Mollard L, Rothman J, et al. Status of p-on-n HgCdTe technologies at DEFIR[C]//Proceedings of SPIE, The International Society for Optical Engineering, Infrared Technology and Applications XXXV, 2009, 7298: 729823.
|
[15] |
Bubulac L O. Diffusion and activation of p-type species for p-on-n junction formation and novel characterization techniques for mercury cadmium telluride epilayers[D]. Los Angeles: University of California, 1991.
|
[16] |
Ryssel H, Lang G, Biersack J P, et al. Ion implantation doping of Cd0.2Hg0.8Te for infrared detectors[J]. IEEE Transactions on Electron Devices, 1980, 27(1): 58-62. DOI: 10.1109/T-ED.1980.19819
|
1. |
王鑫,刘世光,张轶,赵旭豪,王娇. p-on-n型碲镉汞小间距探测器研究. 激光与红外. 2025(03): 395-398 .
![]() | |
2. |
王鑫,刘世光,张轶,王丹,宁提. p-on-n型10μm像元间距长波1280×1024红外探测器制备研究. 红外. 2024(11): 13-16 .
![]() |