衬底热处理对氧化钒薄膜热稳定性的影响

Influence of Substrate Thermal Treatment on Thermostability of Vanadium Oxide Films

  • 摘要: 得益于高的电阻温度系数、低的噪声水平以及良好的CMOS工艺兼容性,氧化钒薄膜是目前非制冷红外探测器领域应用最广泛的热敏材料。为改善非制冷红外探测器在高温视场中的“太阳灼伤”效应,我们优化了探测器的制作流程,增加了衬底热处理工艺,同时研究了衬底热处理对氧化钒材料热稳定性的影响。研究表明,衬底热处理可以明显减少杂质类化学键的种类和数量,改善氮化硅表面的粗糙度,抑制耐温性实验后氧化钒薄膜结晶水平、应力及电阻率的恶化水平。通过对比工艺改善前后两种探测器在高温黑体辐照后输出差值随时间的变化,我们认为衬底热处理有助于提高氧化钒的热稳定性,改善非制冷红外探测器的“太阳灼伤”效应。本文为非制冷红外探测器的可靠性研究提供了新的方向和思路。

     

    Abstract: Due to high temperature coefficient of temperature (TCR), low noise level, and excellent CMOS process compatibility, vanadium oxide films are widely used as thermally sensitive layers in uncooled infrared bolometer detectors. To suppress the sunburn effect in uncooled infrared detectors under high-temperature fields of view, we optimized the detector fabrication process, enhanced substrate thermal treatment techniques, and studied their influence on the thermostability of vanadium oxide films. The results demonstrate that substrate thermal treatment can reduce the types and amounts of impurity bonds, improve the surface roughness of silicon nitride, and inhibit the crystallinity, stress, and resistivity deterioration of vanadium oxide films after thermal tolerance experiments. By comparing the time-dependent output differences between two detectors—with and without optimization—both subjected to prolonged high-temperature blackbody radiation, we conclude that substrate thermal treatment is beneficial for improving the thermostability of vanadium oxide and suppressing the sunburn effect in uncooled infrared detectors. This study provides a new direction for research on the reliability of uncooled infrared detectors.

     

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