Nonuniformity Correction of Infrared Scene Simulator Based on DMD
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摘要: 非均匀性是影响数字微镜器件(Digital Micro-mirror Device,DMD)红外场景产生器投射红外场景质量的主要因素之一,DMD红外场景产生器必须经过非均匀性校正才能满足复杂环境下红外成像设备内场仿真试验的应用要求。给出了DMD红外场景产生器的非均匀性校正流程;提出了一种更适合于现有测试条件的变尺度稀疏网格非均匀性测量方法;采用线性化和分段校正进行离线数据处理;采用“在线查表法”进行实时非均匀性校正。仿真结果表明:经过变尺度稀疏网格测试法及非均匀性实时校正算法,可将非均匀性降低至0.5%左右,显著提高了DMD红外场景产生器的红外场景仿真质量。Abstract: The nonuniformity of an infrared scene simulator based on a digital micro-mirror device(DMD) is one of the major factors affecting its performance, and it must be corrected to satisfy the application requirements of the simulation testing of infrared imaging equipment in complex environments. The nonuniformity correction flow of an infrared scene simulator based on a DMD was investigated in detail. A method for measuring the nonuniformity of a variable scale sparse grid was used to fit the test conditions better. Offline data processing based on linearization and segmentation correction was introduced, and real-time nonuniformity correction based on online table lookup was adopted. The simulation shows that the nonuniformity can be reduced to approximately 0.5% by the variable scale sparse grid measurement and real-time nonuniformity correction. The infrared scene quality of the infrared scene simulator based on a DMD improved significantly.
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Key words:
- infrared scene simulator /
- DMD /
- nonuniformity correction /
- variable scale sparse grid
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表 1 不同分段点数非均匀性校正结果
Table 1. The NUC results about different segmentation points
Number of segment points Residual non-uniformity 3 8.52% 6 4.42% 9 0.52% 12 0.49% 表 2 不同驱动占空比非均匀性校正结果
Table 2. The NUC results about different drive duty cycle
Drive duty cycle Residual non-uniformity (before correction) Residual non-uniformity (after correction) 10% 9.34% 0.42% 20% 9.77% 0.41% 30% 10.13% 0.45% 40% 10.32% 0.43% 50% 10.72% 0.52% 60% 10.71% 0.51% 70% 10.74% 0.52% 80% 10.42% 0.47% 90% 10.25% 0.43% 100% 10.11% 0.44% -
[1] 李卓, 钱丽勋, 欧文.动态红外场景生成新技术[J]. 红外与激光工程, 2012, 41(1): 1-6. doi: 10.3969/j.issn.1007-2276.2012.01.001LI Zhuo, QIAN Lixun, OU Wen. New technologies of infrared scene projection[J]. Infrared and Laser Engineering, 2012, 41(1): 1-6. doi: 10.3969/j.issn.1007-2276.2012.01.001 [2] 陆志沣, 高文, 洪泽华, 等.高逼真度红外复杂场景动态实时生成技术研究[J]. 系统仿真学报, 2017, 27(1): 76-81. https://www.cnki.com.cn/Article/CJFDTOTAL-XTFZ201501010.htmLU Zhifeng, GAO Wen, HONG Zehua, et al. Research on dynamic realtime infrared complicated scene generation technology[J]. Journal of System Simulation, 2017, 27(1): 76-81. https://www.cnki.com.cn/Article/CJFDTOTAL-XTFZ201501010.htm [3] ZHANG Kai, HUANG Yong, YAN Jie, et al. Dynamic infrared scene simulation using grayscale modulation of digital micro-mirror device[J]. Chinese Journal of Aeronautics, 2013, 26(2): 394-400. doi: 10.1016/j.cja.2013.02.017 [4] 徐正平.数字微镜器件在光电设备中的应用[J]. 激光与光电子学进展, 2014, 51: 051103. https://www.cnki.com.cn/Article/CJFDTOTAL-JGDJ201405014.htmXU Zhengping. Application of digital micromirror device in photoelectric equipment[J]. Laser & Optoelectronics Progress, 2014, 51: 051103. https://www.cnki.com.cn/Article/CJFDTOTAL-JGDJ201405014.htm [5] 张颖新, 王云萍, 侯军燕.高帧频DMD红外景象仿真设备电路与光学系统设计[J]. 红外与激光工程, 2017, 46(4): 0404003 https://www.cnki.com.cn/Article/CJFDTOTAL-HWYJ201704013.htmZHANG Yingxin, WANG Yunping, HOU Junyan. Circuit and optical system design for high frame rate DMD infrared scene simulation equipment[J]. Infrared and Laser Engineering, 2017, 46(4): 0404003. https://www.cnki.com.cn/Article/CJFDTOTAL-HWYJ201704013.htm [6] 李艳, 孟庆虎, 吴永刚.国外电阻阵列非均匀性校正技术概述[J]. 红外技术, 2010, 32(8): 453-456. doi: 10.3969/j.issn.1001-8891.2010.08.005LI Yan, MEN Qinhu, WU Yonggang. Resistor array nonuniformity correction technology from foreign countries[J]. Infrared Technology, 2010, 32(8): 453-456. doi: 10.3969/j.issn.1001-8891.2010.08.005 [7] Robert A Joyce, Leszek Swierkowski, Owen M. Williams. Resistor array infrared projectors nonuniformity correction: search for performance improvement Ⅲ[C]//Proc. of SPIE, 2008, 6942: 69420N. [8] Tom Danielsona, Greg Franksa, Joe LaVeignea, et al. Advances in iterative non-uniformity correction techniques for infrared scene projection[C]//Proc. of SPIE, 2015, 9452: 945210. [9] 苏德伦, 廖守亿, 张金生, 等.电阻阵列红外景象投射器非均匀性实时校正[J]. 红外技术, 2014, 36(7): 521-526. http://hwjs.nvir.cn/article/id/hwjs201407002SU Delun, LIAO Shouyi, ZHANG Jinsheng, et al. Resistor array IR scene projector non-uniformity real-time correction[J]. Infrared Technology, 2014, 36(7): 521-526. http://hwjs.nvir.cn/article/id/hwjs201407002 [10] 耿旭, 冯晓晨, 李凡.基于MOS电阻阵列的红外目标模拟器非均匀性校正技术研究[J]. 光学与光电技术, 2012, 10(5): 57-62. https://www.cnki.com.cn/Article/CJFDTOTAL-GXGD201205016.htmGENG Xu, FENG Xiaochen, LI Fan. Infrared target simulator of non-uniformity correction based on MOS resistor arrays[J]. Optics & Optoelectronic Technology, 2012, 10(5): 57-62. https://www.cnki.com.cn/Article/CJFDTOTAL-GXGD201205016.htm [11] 杨春伟, 廖守亿, 苏德伦, 等.电阻阵列非均匀性测试与校正[J].红外技术, 2013, 35(6): 345-349. http://hwjs.nvir.cn/article/id/hwjs201306007YANG Chunwei, LIAO Shouyi, SU Delun, et al. Resistor array nonuniformity measurement and correction[J]. Infrared Technology, 2013, 35(6): 345-349. http://hwjs.nvir.cn/article/id/hwjs201306007 [12] 苏德伦, 王仕成, 张金生, 等.电阻阵列稀疏网格非均匀性修正[J].红外与激光工程, 2009, 38(4): 604-608. doi: 10.3969/j.issn.1007-2276.2009.04.007SU Delun, WANG Shicheng, ZHANG Jinsheng, et al. Sparse grid nonuniformity correction for resistor array[J]. Infrared and Laser Engineering, 2009, 38(4): 604-608. doi: 10.3969/j.issn.1007-2276.2009.04.007