红外用薄形硅窗口加工工艺研究

尹国良, 董汝昆, 应常宇, 谢启明, 张二平, 张红梅, 于闻

尹国良, 董汝昆, 应常宇, 谢启明, 张二平, 张红梅, 于闻. 红外用薄形硅窗口加工工艺研究[J]. 红外技术, 2023, 45(7): 784-789.
引用本文: 尹国良, 董汝昆, 应常宇, 谢启明, 张二平, 张红梅, 于闻. 红外用薄形硅窗口加工工艺研究[J]. 红外技术, 2023, 45(7): 784-789.
YIN Guoliang, DONG Rukun, YING Changyu, XIE Qiming, ZHANG Erping, ZHANG Hongmei, YU Wen. Research on Thin Silicon Windows Processing Technology for Infrared[J]. Infrared Technology , 2023, 45(7): 784-789.
Citation: YIN Guoliang, DONG Rukun, YING Changyu, XIE Qiming, ZHANG Erping, ZHANG Hongmei, YU Wen. Research on Thin Silicon Windows Processing Technology for Infrared[J]. Infrared Technology , 2023, 45(7): 784-789.

红外用薄形硅窗口加工工艺研究

详细信息
    作者简介:

    尹国良(1983-),男,工程师,主要从事红外光学冷加工工艺研究。E-mail:15925229271@126.com

    通讯作者:

    董汝昆(1981-),男,高级工程师,主要从事红外光学材料和半导体材料方面的加工工艺研究。E-mail:345929016@qq.com

  • 中图分类号: TN213

Research on Thin Silicon Windows Processing Technology for Infrared

  • 摘要: 为了满足光电系统中降低载荷和高精度的需求,红外用大尺寸硅窗口经减薄设计后,面形精度要求相比一般红外窗口零件提高1倍,是普通薄形光学窗口零件(径厚比为10:1)的2倍以上,若仍使用常规工艺进行加工,零件精度无法满足技术指标要求。本文结合古典抛光的加工优势,针对硅单晶材料特性,优化胶合剂配比,采用胶点分布的方式粘结加工,通过改变设备主轴转速、零件加工温度等相关技术参数,以及对常规退火与精密退火的硅窗口加工对比研究,解决了红外用薄形硅窗口的加工难题。
    Abstract: To meet the requirements of reduced load and high precision in photoelectric systems, thin silicon infrared windows were designed by increasing the surface accuracy compared with ordinary infrared window parts, and doubling the size of ordinary thin optical window parts (diameter to thickness ratio of 10:1). If the conventional process is used for processing, the parts are unable to meet the technical specifications. This study combines the processing advantages of classical polishing with the characteristics of silicon single-crystal materials; optimizes the adhesive ratio; adopts the adhesive point distribution method of bonding; and solves the processing problems of thin silicon infrared windows by changing relevant technical parameters, such as the spindle speed of the equipment and parts processing temperature. The processing of silicon windows by conventional and precision annealing were also compared.
  • 图  1   薄形硅窗口加工工艺

    Figure  1.   Processing technology of the thin silicon windows

    图  2   常规工艺加工后检测结果

    Figure  2.   Test results after conventional processing

    图  3   常规上盘方式

    Figure  3.   Conventional mounting method

    图  4   胶点分布

    Figure  4.   Adhesive point distribution

    图  5   抛光完工检测结果

    Figure  5.   Test results of polishing completion

    图  6   镀膜完工检测结果

    Figure  6.   Test results of coating completion

    表  1   硅窗口面形和表面光洁度

    Table  1   Silicon windows surface figure and surface smoothness

    No. Diameter/mm Ambient temperature/℃ Spindle speed/(r/min) Element temperature/℃ Mounting Demounting
    Surface figure Surface Smoothness Surface figure Surface Smoothness
    1 ϕ215 mm 22±1℃ 15 25 × ×
    2 20 30 × ×
    3 25 35
    4 28 45
    5 35 50 ×
    6 40 55 ×
    下载: 导出CSV

    表  2   抛光、镀膜完工检测数据

    Table  2   Test data of polishing and coating completed

    No. Diameter/mm Thickness/mm Surface Polishing Coating Mounting Annealing
    PV IRR N ΔN PV IRR N ΔN
    1 ϕ215 10 2.5 2.9 -6 3 1.6 1.9 3 2 normal normal
    1.7 2 -4.5 2 1.6 1.9 -3 1.7
    2 1.5 2.1 -8 1.8 1.4 1.6 1 1.7 normal normal
    1.2 1.3 -3 1 1.1 0.98 -2.5 0.9
    3 1.2 1.1 -9 1 0.9 0.8 0.5 1 normal normal
    1.1 1 -3 0.8 0.9 0.7 -2.5 0.7
    4 0.6 0.7 -12 0.6 0.6 0.7 -4 0.6 Adhesive point precision
    0.6 0.7 -3 0.6 0.8 1 -0.5 0.6
    5 0.5 0.6 -11 0.6 0.6 0.7 -2 0.6 Adhesive point precision
    0.6 0.6 -4.5 0.6 0.7 0.7 -3 0.6
    6 0.5 0.6 -11 0.6 0.6 0.7 -2 0.6 Adhesive point precision
    0.6 0.7 -4 0.6 0.6 0.6 -3 0.6
    下载: 导出CSV
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  • 期刊类型引用(1)

    1. 朱强,周维虎,陈晓梅,石俊凯,李冠楠. 高速实时近红外弱信号检测系统. 光学精密工程. 2022(24): 3116-3127 . 百度学术

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出版历程
  • 收稿日期:  2022-04-10
  • 修回日期:  2022-05-10
  • 刊出日期:  2023-07-19

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