Volume 43 Issue 7
Jul.  2021
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YUAN Shouzhang, ZHAO Wen, KONG Jincheng, WANG Jingyu, JIANG Jun, ZHAO Zenglin, JI Rongbin. Effect of in-Situ Post-annealing on the Second Phase Inclusion Defects[J]. Infrared Technology , 2021, 43(7): 615-621.
Citation: YUAN Shouzhang, ZHAO Wen, KONG Jincheng, WANG Jingyu, JIANG Jun, ZHAO Zenglin, JI Rongbin. Effect of in-Situ Post-annealing on the Second Phase Inclusion Defects[J]. Infrared Technology , 2021, 43(7): 615-621.

Effect of in-Situ Post-annealing on the Second Phase Inclusion Defects

  • Received Date: 2021-05-03
  • Rev Recd Date: 2021-06-28
  • Publish Date: 2021-07-01
  • Second-phase-inclusion defects in Bridgman-grown CdZnTe crystals were decreased via post-growth in-situ annealing combined with excess Cd in CdZnTe ingots. Based on the formation mechanism of the second-phase-inclusion defects in Bridgman-grown CdZnTe, the relationship between second-phase-inclusion defects and annealing temperature was studied. The size of second-phase-inclusion defects was reduced to less than 10 μm and their density to less than 250 cm-2 in CdZnTe at an optimized in-situ post-annealing temperature.
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  • [1]
    Kinch M A. HgCdTe: recent trends in the ultimate IR semiconductor[J]. J. Electron. Mater. , 2010, 39(7): 1043-1052. doi:  10.1007/s11664-010-1087-6
    [2]
    Chang Y, Becker C R, Grein C H, et al. Surface morphology and defect formation mechanisms for HgCdTe (211)B grown by molecular beam epitaxy[J]. Journal of Electronic Materials, 2008, 37: 1171-1183. doi:  10.1007/s11664-008-0477-5
    [3]
    张阳, 吴军, 木胜, 等. CdZnTe中富碲沉积相缺陷引起的液相外延HgCdTe薄膜表面缺陷[J]. 红外与毫米波学报, 2018, 37(6): 728-733. https://www.cnki.com.cn/Article/CJFDTOTAL-HWYH201806016.htm

    ZHANG Yang, WU Jun, MU Sheng, et al. Surface defects of liquid phase epitaxial growth of HgCdTe film induced by Te-rich precipitates in CdZnTe substrates[J]. J. Infrared Millim. Waves, 2018, 37(6): 728-733. https://www.cnki.com.cn/Article/CJFDTOTAL-HWYH201806016.htm
    [4]
    Belas E, Bugár M, Grill R, et al. Elimination of inclusions in (CdZn) Te substrates by post-grown annealing[J]. J. Electron. Mater., 2007, 36: 1025-1030. doi:  10.1007/s11664-007-0167-8
    [5]
    Kim K, Hwang S, Yu H, et al. Two-step annealing to remove Te secondary-phase defects in CdZnTe while preserving the high electrical resistivity[J]. IEEE Transactions on Nuclear Science, 2018, 65(8): 2333-2337. doi:  10.1109/TNS.2018.2856805
    [6]
    SHENG F F, YANG J R, SUN S W, et al. Influence of Cd-rich annealing on defects in Te-rich CdZnTe materials[J]. J. Electron. Mater. , 2014, 43(7): 2702-2708. doi:  10.1007/s11664-014-3140-3
    [7]
    Zanio Kenneth. Chemical Diffusion in Cadmium Telluride[J]. Journal of Applied Physics, 1970, 41(5): 1935-1940. doi:  10.1063/1.1659145
    [8]
    Everson W J, Ard C K, Sepich J L, et al. Etch pit characterization of CdTe and CdZnTe substrates for use in mercury cadmium telluride epitaxy[J]. Journal of Electronic Materials, 1995, 24: 505-510. doi:  10.1007/BF02657954
    [9]
    ZHANG N, Yeckel A, Burger A, et al. Anomalous segregation during electrodynamic gradient freeze growth of cadmium zinc telluride[J]. Journal of Crystal Growth, 2011, 325(1): 10-19. doi:  10.1016/j.jcrysgro.2011.04.041
    [10]
    Roy U N, Weiler S, Stein J. Growth and interface study of 2 in diameter CdZnTe by THM technique[J]. J. Cryst. Growth, 2010, 312(19): 2840-2845. doi:  10.1016/j.jcrysgro.2010.05.046
    [11]
    SHEN J, Aidun D K, Regel L, et al. Characterization of precipitates in CdTe and Cd1xZnxTe grown by vertical Bridgman-Stock barger technique[J]. Journal of Crystal Growth, 1993, 132(1-2): 250-260. doi:  10.1016/0022-0248(93)90269-3
    [12]
    Zanio K. Chemical diffusion in Cadmium Telluride[J]. J. Appl. Phys. , 1970, 41(5): 1935-1940. doi:  10.1063/1.1659145
    [13]
    Jordan A S, Zupp R P. Calculation of the P-T diagrams of CdTe[J]. J. Electrochem. Soc., 1969, 116(9): 1264-1285. doi:  10.1149/1.2412294
    [14]
    Lorenz M R. Phase equilibria in the system Cd-Te[J]. Journal of Physics and Chemistry of Solids, 23(7): 939-947.
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