高空间分辨微通道板现状及发展

邱祥彪; 杨晓明; 孙建宁; 王健; 丛晓庆; 金戈; 曾进能; 张正君; 潘凯; 陈晓倩

高空间分辨微通道板现状及发展

1.
北方夜视科技(南京)研究院有限公司, 江苏南京 211106
2.
北方夜视技术股份有限公司, 云南昆明 650217

详细信息

作者简介:
邱祥彪（1989-），男，硕士，高级工程师，主要研究方向：微通道板及微通道板型光电探测器，E-mail：ndqxb@163.com

中图分类号: TN223
计量
- 文章访问数: 24
- HTML全文浏览量: 13
- PDF下载量: 7
- 被引次数: 0
出版历程
- 收稿日期: 2022-06-15
- 修回日期: 2023-07-29
- 刊出日期: 2024-04-20

Status and Development of High Spatial Resolution Microchannel Plate

1.
North Night Vision Science & Technology (Nanjing) Research Institute Co. Ltd., Nanjing 211106, China
2.
North Night Vision Technology Co. Ltd., Kunming 650217, China

摘要

摘要: 微通道板（MCP）是超二代、三代微光像增强器中的核心元件之一，其空间分辨能力对于微光像增强器分辨力、传函、光晕（Halo）等性能有重要的影响。基于最先进的超二代和三代像增强器所采用MCP的新技术发展，整理国内外已经开展的研究成果报道，从像增强器成像过程中与MCP直接相关的光电子入射至MCP输入面、MCP电子倍增、倍增电子图像输出3个阶段进行系统梳理分析，明确先进像增强器对于微通道板高空间分辨的具体性能需求。提出国产MCP的发展方向展望：未来几年研制孔径5 μm、开口面积比70%左右、输出电极优化的MCP并批量应用；应用于超二代像增强器的MCP需要开展小孔径扩口以及电子减速膜等新技术研究，使MCP开口面积比达到90%以上、像增强器传函与对比度性能显著提升；应用于三代像增强器的MCP需要开展低放气、低离子反馈MCP研究以支撑无膜三代像增强器的研发，抑制Halo、提高信噪比，在实现无膜MCP的基础上，扩口技术、输入增强膜层技术、电子减速膜等MCP技术均有应用于三代像增强器中的潜力。
- 微通道板 /
- 分辨力 /
- 小孔径 /
- 扩口微通道板 /
- 输出电极 /
- 电子减速膜
Abstract: Microchannel plates (MCP) are the core components of super GEN Ⅱ and GEN Ⅲ low-light-level image intensifiers. The spatial resolution has a significant effect on the resolution, transmission, and halo performance of low-light-level image intensifiers. The research results at home and abroad are reviewed based on the new technology development of the MCP used by the most advanced super GEN Ⅱ and GEN Ⅲ intensifiers. The specific performance requirements of advanced image intensifiers for the high spatial resolution of microchannel plates are verified by a systematic analysis of the three stages of photon input to the MCP surface, MCP electron multiplication, and multiplication electron image output in the imaging process of the image intensifier. The development trends of domestic MCP is put forward: the MCP with an aperture of 5 μm, an opening area ratio of approximately 70% and optimized output electrode will be developed and applied in batch in the next few years. The MCP applied to the super GEN Ⅱ image intensifier needs to conduct research on new technologies such as a small aperture funnel MCP technology and electron deceleration film, so that the MCP opening area ratio can reach more than 90% and the modulation transfer function and contrast performance of the image intensifier can be significantly improved. MCP with a low outgassing and low ion feedback are needed in the research to support the unfilmed GEN Ⅲ, which can inhibit Halo and improve the signal-to-noise ratio. Based on the unfilmed intensifier, the funnel MCP technology, input enhancement film technology, and electron deceleration film technology have the potential to be used in GEN Ⅲ intensifier.
- microchannel plate /
- resolution /
- small aperture /
- funnel MCP technology /
- output electrode /
- electron deceleration film

HTML全文

图 1 光子散射噪声形成示意图^[10]

Figure 1. Schematic diagram of photon scattering^[10]

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图 2 干法刻蚀形成扩口MCP示意图^[13]

Figure 2. Schematic diagram of funnel MCP manufacture by dryetching^[13]

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图 3 MCP非开口面电子散射示意图^[14]

Figure 3. Schematics of electrons scattering for MCP non-open area^[14]

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图 4 标准三代与NGEOS无膜三代像增强器Halo对比^[7]

Figure 4. Halo of standard GEN Ⅲ and NGEOS Halo free I²^[7]

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图 5 MCP输入端镀膜示意图

Figure 5. Diagram of input end of MCP with coated film

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图 6 镀膜A区与未镀膜B区传函对比^[18]

Figure 6. MTF of zone A (Coated) and zone B (Uncoated)^[18]

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图 7 二次电子运动示意图^[18]

Figure 7. Diagram of trajectory of secondary electron^[18]

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图 8 孔径5 μm MCP与孔径2 μm MCP对比^[21]

Figure 8. Comparison of the 5 μm pore and 2 μm pore MCP^[21]

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图 9 微通道板孔间距与传函关系^[21]

Figure 9. Progression of MCP pitch versus MTF^[21]

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图 10 孔径5 μm MCP与孔径2 μm MCP分辨力对比^[21]

Figure 10. Resolution comparison between 2 μm pore MCP and 5 μm pore MCP^[21]

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图 11 不同斜切角MCP对应MTF曲线^[22]

Figure 11. MTF curves of MCP with different bias angles^[22]

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图 12 MCP输出电子能量分布^[24]

Figure 12. Energy distribution of output electrons from MCP^[24]

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图 13 沟槽结构模型及不同结构二次电子发射系数^[26]

Figure 13. Trench structure model and secondary electron emission coefficients of different structures^[26]

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图 14 不同腐蚀工艺构造缺陷及二次电子发射系数^[29]

Figure 14. Structural defects and secondary electron emission coefficients of different corrosion processes^[29]

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图 15 MCP输出电子轨迹示意图：(a) 无电子减速膜，(b) 有电子减速膜

Figure 15. Schematic diagram of output electron trajectory of MCP: (a) without electron deceleration film, (b) with electron deceleration film

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