[1]孔金丞,覃 钢,秦 强,等.碲镉汞红外焦平面响应图“交叉线”特征起源探讨[J].红外技术,2019,41(2):101-106.[doi:10.11846/j.issn.1001_8891.201902001]
 KONG Jincheng,QIN Gang,QIN Qiang,et al.Crosshatch Pattern on HgCdTe FPA Response Imaging[J].Infrared Technology,2019,41(2):101-106.[doi:10.11846/j.issn.1001_8891.201902001]
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碲镉汞红外焦平面响应图“交叉线”特征起源探讨
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《红外技术》[ISSN:1001-8891/CN:CN 53-1053/TN]

卷:
41卷
期数:
2019年第2期
页码:
101-106
栏目:
出版日期:
2019-02-22

文章信息/Info

Title:
Crosshatch Pattern on HgCdTe FPA Response Imaging
文章编号:
1001-8891(2019)02-0101-06
作者:
孔金丞覃 钢秦 强李立华毛京湘
昆明物理研究所,云南 昆明 650223
Author(s):
KONG JinchengQIN GangQIN QiangLI LihuaMAO Jingxiang
Kunming Institute of Physics, Kunming 650223, China
关键词:
碲镉汞晶格失配滑移系统残余应变交叉线
Keywords:
HgCdTelattice mismatchslip systemresidual straincrosshatch pattern
分类号:
TN215,TN304
DOI:
10.11846/j.issn.1001_8891.201902001
文献标志码:
A
摘要:
对碲镉汞红外焦平面热响应图“交叉线”特征起源进行了研究。基于碲镉汞的闪锌矿结构晶体滑移系统理论,讨论了不同滑移面与碲镉汞薄膜生长所用(111)B面和(211)B面交线的方向,从晶格失配和应力释放的角度探讨了碲镉汞薄膜表面交叉线形貌与X射线衍射交叉线貌相的起源与几何结构,分析了碲镉汞薄膜交叉线与材料晶体质量之间的关系,探讨了碲镉汞红外焦平面热响应图交叉线特征的起源及其与器件性能的关系。
Abstract:
In this paper, we reviewed the crosshatch patterns commonly found on HgCdTe infrared FPA(focal plane array) response imaging, which were associated with the intersection between the (111) growth plane and each of the eight equivalent HgCdTe slip planes. Crosshatch patterns can also be observed using Nomarski micrograph and X-ray diffraction morphologies on a HgCdTe film surface. The schematic representation of the geometric relationship between crosshatch lines and the different directions of the CdZnTe substrate were demonstrated. The relationship between the crosshatch pattern morphology and crystallinity of HgCdTe films as well as the device performance were discussed.

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备注/Memo

备注/Memo:
收稿日期:2018-11-12;修订日期:2018-11-29.
作者简介:孔金丞(1979-),男,云南南华人,研究员,博士,主要从事红外探测器材料与器件技术研究。E-mail:kongjincheng@163.com。
更新日期/Last Update: 2019-02-21