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黑曲霉菌对Ge镀增透膜层的腐蚀行为研究

戈帆 郭骞 肖建军 刘剑 杨玉萍 王冲文 刘艳芳 罗瑞 赵远荣 杨品杰 刘云红

戈帆, 郭骞, 肖建军, 刘剑, 杨玉萍, 王冲文, 刘艳芳, 罗瑞, 赵远荣, 杨品杰, 刘云红. 黑曲霉菌对Ge镀增透膜层的腐蚀行为研究[J]. 红外技术, 2022, 44(11): 1228-1235.
引用本文: 戈帆, 郭骞, 肖建军, 刘剑, 杨玉萍, 王冲文, 刘艳芳, 罗瑞, 赵远荣, 杨品杰, 刘云红. 黑曲霉菌对Ge镀增透膜层的腐蚀行为研究[J]. 红外技术, 2022, 44(11): 1228-1235.
GE Fan, GUO Qian, XIAO Jianjun, LIU Jian, YANG Yuping, WANG Chongwen, LIU Yanfang, LUO Rui, ZHAO Yuanrong, YANG Pinjie, LIU Yunhong. Study on Corrosion Behavior of Aspergillus niger on Ge Antireflection Coating[J]. Infrared Technology , 2022, 44(11): 1228-1235.
Citation: GE Fan, GUO Qian, XIAO Jianjun, LIU Jian, YANG Yuping, WANG Chongwen, LIU Yanfang, LUO Rui, ZHAO Yuanrong, YANG Pinjie, LIU Yunhong. Study on Corrosion Behavior of Aspergillus niger on Ge Antireflection Coating[J]. Infrared Technology , 2022, 44(11): 1228-1235.

黑曲霉菌对Ge镀增透膜层的腐蚀行为研究

基金项目: 

国防技术基础科研项目 JSHS2019610B001-2

详细信息
    作者简介:

    戈帆(1990-),男,云南保山人,工程师,硕士研究生,主要研究方向环境试验。E-mail: 690649833@qq.com

  • 中图分类号: TN213

Study on Corrosion Behavior of Aspergillus niger on Ge Antireflection Coating

  • 摘要: 为开发新型保护膜系和光学系统的防霉设计提供数据支撑,了解Ge镀增透膜层在黑曲霉环境下的腐蚀行为,有助于提高红外窗口材料的环境适应性。通过霉菌加速试验,采用荧光显微镜、扫描电镜、X射线光电子能谱等,研究黑曲霉菌对Ge镀增透膜层样品的腐蚀行为及影响规律。黑曲霉菌为产酸型微生物,在稳定期时,它的生物量最高,细胞代谢产物的积累达到高峰,在对数生长阶段,由其引起的生长环境pH值变化显著,增加了环境的酸度;黑曲霉菌初始以Ge镀增透膜层样品表层吸附的碳元素为营养粘附于样品表面,并在样品表面大量繁殖,消耗样品表层的碳含量,随着黑曲霉菌的大量繁殖,样品表面的pH值也随之降低,样品表面的金属元素被氧化,开始逐步溶解,Ge镀增透膜层样品表层的锗元素、锌元素相继被剥离,参与反应后,样品的表层形貌被破坏严重,形成了大量的腐蚀坑。黑曲霉菌对Ge镀增透膜层的腐蚀行为以点蚀方式为主,它的生长代谢作用促进Ge镀增透膜层的腐蚀。
  • 图  1  黑曲霉菌生长曲线

    Figure  1.  Growth curve of Aspergillus niger

    图  2  黑曲霉菌生长期间介质pH的变化

    Figure  2.  pH variation of Aspergillus niger during its growth

    图  3  黑曲霉菌在Ge镀增透膜层样品表面荧光显微镜测试

    Figure  3.  Fluorescence microscope test chart of Aspergillus niger on the surface of antireflective coating sample coated with GE

    图  4  黑曲霉菌对Ge镀增透膜层腐蚀形貌测试

    Figure  4.  Corrosion morphology test of antireflective coating on Ge plating by Aspergillus niger

    图  5  黑曲霉菌对Ge镀增透膜层腐蚀前(a)后(b)对比图

    Figure  5.  Comparison of the antireflection coating of Ge plating by Aspergillus niger before(a) and after(b) corrosion

    图  6  黑曲霉菌对Ge镀增透膜层腐蚀前(a)后(b)原子力显微镜测试

    Figure  6.  Atomic force microscope test chart of Aspergillus niger before(a) and after(b) corrosion of antireflective coating of Ge plating

    图  7  材料表面原子力显微镜测试数据

    Figure  7.  Test data of material surface by atomic force microscope

    图  8  黑曲霉菌对Ge镀增透膜层腐蚀红外光谱分析

    Figure  8.  Infrared analysis on Corrosion of antireflective coating of Ge plating by Aspergillus niger

    图  9  黑曲霉菌对Ge镀增透膜层腐蚀紫外分析

    Figure  9.  UV analysis on Corrosion of antireflective coating of Ge plating by Aspergillus niger

    图  10  黑曲霉菌对Ge镀增透膜层腐蚀产物分析

    Figure  10.  Analysis of corrosion products of Ge plating antireflection coating by Aspergillus niger

    表  1  能谱元素分析结果

    Table  1.   Results of energy spectrum element analysis

    Element/wt% C O F S Yb Zn Ge Others
    Control 8.77 1.59 7.44 13.19 45.69 18.26 5.06 <0.001
    Aspergillus niger 46.77 9.07 4.21 6.68 20.65 10.52 2.10 <0.001
    下载: 导出CSV
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  • 收稿日期:  2022-04-13
  • 修回日期:  2022-05-11
  • 刊出日期:  2022-11-20

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